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00:02Samsung and TSMC have committed to using ASML's High NA Extreme Ultraviolet Lithography machines
00:09as demand grows for more advanced chips, according to CNBC.
00:13The machines, which can cost around $400 million,
00:17can print smaller and more intricate circuit patterns onto silicon wafers.
00:22Samsung said it plans to use the technology for DRAM production,
00:25while TSMC expects High NA adoption to rise as AI applications require increasingly complex transistor architectures.
00:34Investors view the success of ASML's High NA EUV machines as critical to future growth
00:40after the stock gained 120% over the past year.
00:43Barclays said the announcements provide more visibility into High NA adoption
00:47and could help ASML plan future EUV capacity.
00:51Samsung and TSMC will also join ASML in an initiative to develop larger 12-inch photo masks
00:58aimed at improving productivity and lowering chipmaking costs.
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